Precise parameterization of the recombination velocity at passivated phosphorus doped surfaces

Journal Article · Thu Jan 14 04:00:00 EST 2016 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4939960· OSTI ID:22494917

Kimmerle, Achim; Momtazur Rahman, Md.; Werner, Sabrina; Mack, Sebastian; Wolf, Andreas; Richter, Armin ^[1]; Haug, Halvard ^[2]

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1. Fraunhofer Institute for Solar Energy Systems (ISE), Heidenhofstraße 2, 79110 Freiburg (Germany)
2. Institute for Energy Technology, Instituttveien 18, 2007 Kjeller (Norway)

We investigate the surface recombination velocity S{sub p} at the silicon-dielectric interface of phosphorus-doped surfaces for two industrially relevant passivation schemes for crystalline silicon solar cells. A broad range of surface dopant concentrations together with a high accuracy of evaluating the latter is achieved by incremental back-etching of the surface. The analysis of lifetime measurements and the simulation of the surface recombination consistently apply a set of well accepted models, namely, the Auger recombination by Richter et al. [Phys. Rev. B 86, 1–14 (2012)], the carrier mobility by Klaassen [Solid-State Electron. 35, 953–959 (1992); 35, 961–967 (1992)], the intrinsic carrier concentration for undoped silicon by Altermatt et al. [J. Appl. Phys. 93, 1598–1604 (2003)], and the band-gap narrowing by Schenk [J. Appl. Phys. 84, 3684–3695 (1998)]. The results show an increased S{sub p} at textured in respect to planar surfaces. The obtained parameterizations are applicable in modern simulation tools such as EDNA [K. R. McIntosh and P. P. Altermatt, in Proceedings of the 35th IEEE Photovoltaic Specialists Conference, Honolulu, Hawaii, USA (2010), pp. 1–6], PC1Dmod [Haug et al., Sol. Energy Mater. Sol. Cells 131, 30–36 (2014)], and Sentaurus Device [Synopsys, Sentaurus TCAD, Zürich, Switzerland] as well as in the analytical solution under the assumption of local charge neutrality by Cuevas et al. [IEEE Trans. Electron Devices 40, 1181–1183 (1993)].

• OSTI ID: 22494917
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 2 Vol. 119; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CARRIER MOBILITY
DIELECTRIC MATERIALS
DOPED MATERIALS
PASSIVATION
PHOSPHORUS
PHOTOVOLTAIC EFFECT
RECOMBINATION
SILICON SOLAR CELLS
SURFACES
VELOCITY