Stabilizing the ferroelectric phase in doped hafnium oxide
- NaMLab gGmbH, Noethnitzer Str. 64, D-01187 Dresden (Germany)
- Materials Research Center for Element Strategy, Tokyo Institute of Technology, Yokohama 226-8503 (Japan)
- Leibniz IFW Dresden, Helmholtzstr.20, D-01171 Dresden (Germany)
- Fraunhofer IPMS-CNT, Koenigsbruecker Str. 180, D-01099 Dresden (Germany)
- Imec, Kapeldreef 75, B-3001 Leuven (Belgium)
- Munich University of Applied Sciences, Loth Str. 34, D-80335 Munich (Germany)
The ferroelectric properties and crystal structure of doped HfO{sub 2} thin films were investigated for different thicknesses, electrode materials, and annealing conditions. Metal-ferroelectric-metal capacitors containing Gd:HfO{sub 2} showed no reduction of the polarization within the studied thickness range, in contrast to hafnia films with other dopants. A qualitative model describing the influence of basic process parameters on the crystal structure of HfO{sub 2} was proposed. The influence of different structural parameters on the field cycling behavior was examined. This revealed the wake-up effect in doped HfO{sub 2} to be dominated by interface induced effects, rather than a field induced phase transition. TaN electrodes were shown to considerably enhance the stabilization of the ferroelectric phase in HfO{sub 2} compared to TiN electrodes, yielding a P{sub r} of up to 35 μC/cm{sup 2}. This effect was attributed to the interface oxidation of the electrodes during annealing, resulting in a different density of oxygen vacancies in the Gd:HfO{sub 2} films. Ab initio simulations confirmed the influence of oxygen vacancies on the phase stability of ferroelectric HfO{sub 2}.
- OSTI ID:
- 22494746
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 7 Vol. 118; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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