Optical characteristics for capacitively and inductively radio frequency discharge and post-discharge of helium
- Department of Physics, Anadolu University, Yunusemre Campus 26470 Eskişehir (Turkey)
The optical properties for radiofrequency (RF) post-discharge of pure helium (He) with two different methods as capacitively and inductively have been presented using the modified Boltzmann method in comparison. Optical emission spectroscopy (OES) is often used in the diagnosis of laboratory plasma, such as gas discharge plasma. OES is a very useful method for calculating of the electron temperature in the plasma and the determination of different atoms and molecules. In this study, OES is applied for characterizations of capacitively and inductively RF He plasma at pressures between 0.62 and 2.2 mbar for newly reactor type. Plasmas are generated with an RF power generator at a frequency of 13.56 MHz and output powers of 100, 160, and 200 W. Spectra have been evaluated in the range 200–1200 nm by an optical spectrometer. At low pressure, the main spectral features reported are the wavelengths of the atomic He transitions at 388.87 and 728.13 nm. The atomic emission intensities showed a maximum in inductive system when the pressure is about 0.62 mbar. OES of capacitive discharge and inductive discharge is compared in detail. The transition for 587.56 nm is shown to be increased in time.
- OSTI ID:
- 22493862
- Journal Information:
- Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 1 Vol. 23; ISSN PHPAEN; ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
Similar Records
Influence of oxygen traces on an atmospheric-pressure radio-frequency capacitive argon plasma discharge
Characteristics of molecular hydrogen and CH* radicals in a methane plasma in a magnetically enhanced capacitive RF discharge
Coupling effects in inductive discharges with radio frequency substrate biasing
Journal Article
·
Sat Oct 15 00:00:00 EDT 2011
· Physics of Plasmas
·
OSTI ID:22046992
Characteristics of molecular hydrogen and CH* radicals in a methane plasma in a magnetically enhanced capacitive RF discharge
Journal Article
·
Sat Sep 15 00:00:00 EDT 2007
· Plasma Physics Reports
·
OSTI ID:21100138
Coupling effects in inductive discharges with radio frequency substrate biasing
Journal Article
·
Sun Jan 08 23:00:00 EST 2012
· Applied Physics Letters
·
OSTI ID:22025407