Numerical evaluation of a 13.5-nm high-brightness microplasma extreme ultraviolet source
- Department of Electrical and Electronic Engineering, Faculty of Engineering and Center for Optical Research and Education (CORE), Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi 321-8585 (Japan)
- Department of Electrical Engineering, Nagaoka University of Technology, Nagaoka, Niigata 940-2188 (Japan)
- HiLASE Centre, Institute of Physics CAS, Za radnicí 828, 252 41 Dolní Břežany (Czech Republic)
- Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai 980-8577 (Japan)
- School of Nuclear Science and Technology, Lanzhou University, Lanzhou 730000 (China)
- School of Physics, University College Dublin, Belfield, Dublin 4 (Ireland)
- Institute for Laser Technology, 2-6 Yamada-oka, Suita, Osaka 565-0871 (Japan)
The extreme ultraviolet (EUV) emission and its spatial distribution as well as plasma parameters in a microplasma high-brightness light source are characterized by the use of a two-dimensional radiation hydrodynamic simulation. The expected EUV source size, which is determined by the expansion of the microplasma due to hydrodynamic motion, was evaluated to be 16 μm (full width) and was almost reproduced by the experimental result which showed an emission source diameter of 18–20 μm at a laser pulse duration of 150 ps [full width at half-maximum]. The numerical simulation suggests that high brightness EUV sources should be produced by use of a dot target based microplasma with a source diameter of about 20 μm.
- OSTI ID:
- 22492938
- Journal Information:
- Journal of Applied Physics, Vol. 118, Issue 19; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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