Structural properties of a-Si films and their effect on aluminum induced crystallization
- Center for Solar Energy Research and Applications (GÜNAM), Middle East Technical University, Ankara 06800 (Turkey)
- Central Laboratory, Middle East Technical University, Ankara 06800 (Turkey)
In this paper, we report the influence of the structural properties of amorphous silicon (a-Si) on its subsequent crystallization behavior via the aluminum induced crystallization (AIC) method. Two distinct a-Si deposition techniques, electron beam evaporation and plasma enhanced chemical vapor deposition (PECVD), are compared for their effect on the overall AIC kinetics as well as the properties of the final poly-crystalline (poly-Si) silicon film. Raman and FTIR spectroscopy results indicate that the PECVD grown a-Si films has higher intermediate-range order, which is enhanced for increased hydrogen dilution during deposition. With increasing intermediate-range order of the a-Si, the rate of AIC is diminished, leading larger poly-Si grain size.
- OSTI ID:
- 22492127
- Journal Information:
- AIP Advances, Vol. 5, Issue 10; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 2158-3226
- Country of Publication:
- United States
- Language:
- English
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