Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Simulation of a runaway electron avalanche developing in an atmospheric pressure air discharge

Journal Article · · Physics of Plasmas
DOI:https://doi.org/10.1063/1.4936826· OSTI ID:22489966
 [1];  [1];  [2]
  1. P. N. Lebedev Physical Institute, RAS, 119991 Moscow (Russian Federation)
  2. Institute of High Current Electrons, SB, RAS, 634055 Tomsk (Russian Federation)
To gain a better understanding of the operation of atmospheric pressure air discharges, the formation of a runaway electron beam at an individual emission site on the cathode has been numerically simulated. The model provides a description of the dynamics of the fast electrons emitted into an air gap from the surface of the emission zone by solving numerically two-dimensional equations for the electrons. It is supposed that the electric field at the surface of the emission zone is enhanced, providing conditions for continuous acceleration of the emitted electrons. It is shown that the formation of a runaway electron beam in a highly overvolted discharge is largely associated with avalanche-type processes and that the number of electrons in the avalanche reaches 50% of the total number of runaway electrons.
OSTI ID:
22489966
Journal Information:
Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 12 Vol. 22; ISSN PHPAEN; ISSN 1070-664X
Country of Publication:
United States
Language:
English

Similar Records

Mechanism of Runaway Electron Generation at Gas Pressures from a Few Atmospheres to Several Tens of Atmospheres
Journal Article · Sun Apr 15 00:00:00 EDT 2018 · Plasma Physics Reports · OSTI ID:22763280

Time evolution of nanosecond runaway discharges in air and helium at atmospheric pressure
Journal Article · Fri Dec 14 23:00:00 EST 2012 · Physics of Plasmas · OSTI ID:22072669

Parameters of a supershort avalanche electron beam generated in atmospheric-pressure air
Journal Article · Sun May 15 00:00:00 EDT 2011 · Plasma Physics Reports · OSTI ID:22047530