Injection of auxiliary electrons for increasing the plasma density in highly charged and high intensity ion sources

Journal Article · Mon Feb 15 00:00:00 EST 2016 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4933020· OSTI ID:22482899

Malferrari, L.; Montanari, A. ^[1]; Rizzoli, R. ^[1]; Mascali, D.; Castro, G.; Celona, L.; Gammino, S.; Neri, L. ^[2]

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1. INFN—Bologna, Viale B. Pichat, 6/2, 40127 Bologna (Italy)
2. INFN–Laboratori Nazionali del Sud, Via S. Sofia 62, 95125 Catania (Italy)

Different electron guns based on cold- or hot-cathode technologies have been developed since 2009 at INFN for operating within ECR plasma chambers as sources of auxiliary electrons, with the aim of boosting the source performances by means of a higher plasma lifetime and density. Their application to microwave discharge ion sources, where plasma is not confined, has required an improvement of the gun design, in order to “screen” the cathode from the plasma particles. Experimental tests carried out on a plasma reactor show a boost of the plasma density, ranging from 10% to 90% when the electron guns are used, as explained by plasma diffusion models.

• OSTI ID: 22482899
• Journal Information: Review of Scientific Instruments, Vol. 87, Issue 2; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
CATHODES
DESIGN
ELECTRON CYCLOTRON-RESONANCE
ELECTRON GUNS
ELECTRONS
HIGH-FREQUENCY DISCHARGES
ION SOURCES
LIFETIME
PLASMA DENSITY