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Title: Nitrogen ion implantation into various materials using 28 GHz electron cyclotron resonance ion source

Abstract

The installation of the 28 GHz electron cyclotron resonance ion source (ECRIS) ion implantation beamline was recently completed at the Korea Basic Science Institute. The apparatus contains a beam monitoring system and a sample holder for the ion implantation process. The new implantation system can function as a multipurpose tool since it can implant a variety of ions, ranging hydrogen to uranium, into different materials with precise control and with implantation areas as large as 1–10 mm{sup 2}. The implantation chamber was designed to measure the beam properties with a diagnostic system as well as to perform ion implantation with an in situ system including a mass spectrometer. This advanced implantation system can be employed in novel applications, including the production of a variety of new materials such as metals, polymers, and ceramics and the irradiation testing and fabrication of structural and functional materials to be used in future nuclear fusion reactors. In this investigation, the first nitrogen ion implantation experiments were conducted using the new system. The 28 GHz ECRIS implanted low-energy, multi-charged nitrogen ions into copper, zinc, and cobalt substrates, and the ion implantation depth profiles were obtained. SRIM 2013 code was used to calculate the profiles undermore » identical conditions, and the experimental and simulation results are presented and compared in this report. The depths and ranges of the ion distributions in the experimental and simulation results agree closely and demonstrate that the new system will enable the treatment of various substrates for advanced materials research.« less

Authors:
 [1];  [2]; ; ; ; ; ; ; ; ; ;  [1];  [3]
  1. Busan Center, Korea Basic Science Institute, Busan 609-735 (Korea, Republic of)
  2. (Korea, Republic of)
  3. School of Mechanical Engineering, Pusan National University, Pusan 609-735 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22482873
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 87; Journal Issue: 2; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; BEAM MONITORING; CERAMICS; COBALT; CONTROL; COPPER; DEPTH; ECR ION SOURCES; GHZ RANGE 01-100; ION IMPLANTATION; MASS SPECTROMETERS; MATERIALS; NITROGEN IONS; SAMPLE HOLDERS; SIMULATION; SUBSTRATES; THERMONUCLEAR REACTORS

Citation Formats

Shin, Chang Seouk, School of Mechanical Engineering, Pusan National University, Pusan 609-735, Lee, Byoung-Seob, Choi, Seyong, Yoon, Jang-Hee, Kim, Hyun Gyu, Ok, Jung-Woo, Park, Jin Yong, Kim, Seong Jun, Bahng, Jungbae, Hong, Jonggi, Won, Mi-Sook, E-mail: mswon@kbsi.re.kr, and Lee, Seung Wook, E-mail: Seunglee@pusan.ac.kr. Nitrogen ion implantation into various materials using 28 GHz electron cyclotron resonance ion source. United States: N. p., 2016. Web. doi:10.1063/1.4932126.
Shin, Chang Seouk, School of Mechanical Engineering, Pusan National University, Pusan 609-735, Lee, Byoung-Seob, Choi, Seyong, Yoon, Jang-Hee, Kim, Hyun Gyu, Ok, Jung-Woo, Park, Jin Yong, Kim, Seong Jun, Bahng, Jungbae, Hong, Jonggi, Won, Mi-Sook, E-mail: mswon@kbsi.re.kr, & Lee, Seung Wook, E-mail: Seunglee@pusan.ac.kr. Nitrogen ion implantation into various materials using 28 GHz electron cyclotron resonance ion source. United States. doi:10.1063/1.4932126.
Shin, Chang Seouk, School of Mechanical Engineering, Pusan National University, Pusan 609-735, Lee, Byoung-Seob, Choi, Seyong, Yoon, Jang-Hee, Kim, Hyun Gyu, Ok, Jung-Woo, Park, Jin Yong, Kim, Seong Jun, Bahng, Jungbae, Hong, Jonggi, Won, Mi-Sook, E-mail: mswon@kbsi.re.kr, and Lee, Seung Wook, E-mail: Seunglee@pusan.ac.kr. 2016. "Nitrogen ion implantation into various materials using 28 GHz electron cyclotron resonance ion source". United States. doi:10.1063/1.4932126.
@article{osti_22482873,
title = {Nitrogen ion implantation into various materials using 28 GHz electron cyclotron resonance ion source},
author = {Shin, Chang Seouk and School of Mechanical Engineering, Pusan National University, Pusan 609-735 and Lee, Byoung-Seob and Choi, Seyong and Yoon, Jang-Hee and Kim, Hyun Gyu and Ok, Jung-Woo and Park, Jin Yong and Kim, Seong Jun and Bahng, Jungbae and Hong, Jonggi and Won, Mi-Sook, E-mail: mswon@kbsi.re.kr and Lee, Seung Wook, E-mail: Seunglee@pusan.ac.kr},
abstractNote = {The installation of the 28 GHz electron cyclotron resonance ion source (ECRIS) ion implantation beamline was recently completed at the Korea Basic Science Institute. The apparatus contains a beam monitoring system and a sample holder for the ion implantation process. The new implantation system can function as a multipurpose tool since it can implant a variety of ions, ranging hydrogen to uranium, into different materials with precise control and with implantation areas as large as 1–10 mm{sup 2}. The implantation chamber was designed to measure the beam properties with a diagnostic system as well as to perform ion implantation with an in situ system including a mass spectrometer. This advanced implantation system can be employed in novel applications, including the production of a variety of new materials such as metals, polymers, and ceramics and the irradiation testing and fabrication of structural and functional materials to be used in future nuclear fusion reactors. In this investigation, the first nitrogen ion implantation experiments were conducted using the new system. The 28 GHz ECRIS implanted low-energy, multi-charged nitrogen ions into copper, zinc, and cobalt substrates, and the ion implantation depth profiles were obtained. SRIM 2013 code was used to calculate the profiles under identical conditions, and the experimental and simulation results are presented and compared in this report. The depths and ranges of the ion distributions in the experimental and simulation results agree closely and demonstrate that the new system will enable the treatment of various substrates for advanced materials research.},
doi = {10.1063/1.4932126},
journal = {Review of Scientific Instruments},
number = 2,
volume = 87,
place = {United States},
year = 2016,
month = 2
}
  • A new concept on magnetic field with all magnets on plasma production and confinement has been proposed to enhance efficiency of an electron cyclotron resonance (ECR) plasma for broad and dense ion beam source under the low pressure. The magnetic field configuration is constructed by a pair of magnets assembly, i.e., comb-shaped magnet which cylindrically surrounds the plasma chamber. The resonance zones corresponding to the fundamental ECR for 2.45 GHz and 11-13 GHz frequencies are constructed at different positions. The profiles of the plasma parameters in the ECR ion source are different from each frequency of microwave. Large bore extractormore » is set at the opposite side against the microwave feeds. It is found that differences of their profiles also appear at those of ion beam profiles. We conducted to launch simultaneously multiplex frequencies microwaves controlled individually, and tried to control the profiles of the plasma parameters and then those of extracted ion beam.« less
  • We are constructing a tandem type electron cyclotron resonance (ECR) ion source (ECRIS). High-energy electrons in ECRIS plasma affect electron energy distribution and generate multicharged ion. In this study, we measure electron energy distribution function (EEDF) of low energy region (≦100 eV) in ECRIS plasma at extremely low pressures (10{sup −3}–10{sup −5} Pa) by using cylindrical Langmuir probe. From the result, it is found that the EEDF correlates with the electron density and the temperature from the conventional probe analysis. In addition, we confirm that the tail of EEDF spreads to high energy region as the pressure rises and thatmore » there are electrons with high energy in ECR multicharged ion source plasma. The effective temperature estimated from the experimentally obtained EEDF is larger than the electron temperature obtained from the conventional method.« less
  • Multicharged ions that are needed are produced from solid pure material with high melting point in an electron cyclotron resonance ion source. We develop an evaporator by using induction heating (IH) with multilayer induction coil, which is made from bare molybdenum or tungsten wire without water cooling and surrounding the pure vaporized material. We optimize the shapes of induction coil and vaporized materials and operation of rf power supply. We conduct experiment to investigate the reproducibility and stability in the operation and heating efficiency. IH evaporator produces pure material vapor because materials directly heated by eddy currents have no contactmore » with insulated materials, which are usually impurity gas sources. The power and the frequency of the induction currents range from 100 to 900 W and from 48 to 23 kHz, respectively. The working pressure is about 10{sup -4}-10{sup -3} Pa. We measure the temperature of the vaporized materials with different shapes, and compare them with the result of modeling. We estimate the efficiency of the IH vapor source. We are aiming at the evaporator's higher melting point material than that of iron.« less
  • We measured the main plasma parameters (density of electron, temperature of electrons, and ion confinement time) as a function of B{sub min} and B{sub inj} with laser ablation technique. We observed that the B{sub min} mainly affects the temperature and density of electrons and all of the three parameters increase with increasing the B{sub inj}. We also observed that the gas pressure of the plasma chamber at the rf injection side became minimum at the optimum value for B{sub min} at fixed gas flow. This result indicates that the ionization efficiency becomes maximum at optimum value for B{sub min}. Frommore » these results, it is concluded that the plasma production is strongly dependent on the B{sub min} (plasma generator). We also observed that the B{sub inj} affects the ion confinement time, temperature, and density of electrons. All of the three parameters increase with increasing B{sub inj}.« less
  • LECR4 (Lanzhou electron cyclotron resonance ion source No. 4) has been successfully constructed at IMP and has also been connected with the Low Energy Beam Transport (LEBT) and Radio Frequency Quadrupole (RFQ) systems. These source magnet coils are cooled through evaporative cooling technology, which is the first attempt with an ECR ion source in the world. The maximum mirror field is 2.5 T (with iron plug) and the effective plasma chamber volume is 1.2 l. It was designed to be operated at 18 GHz and aimed to produce intense multiple charge state heavy ion beams for the linear injector projectmore » SSC-Linac at IMP. In February 2014, the first analyzed beam at 18 GHz was extracted. During about three months’ commissioning, some outstanding results have been achieved, such as 1.97 emA of O{sup 6+}, 1.7 emA of Ar{sup 8+}, 1.07 emA of Ar{sup 9+}, and 118 euA of Bi{sup 28+}. The source has also successfully delivered O{sup 5+} and Ar{sup 8+} ion beams for RFQ commissioning in April 2014. This paper will give a brief overview of the design of LECR4. Then, the latest results of this source at 18 GHz will be presented.« less