Strongly compressed Bi (111) bilayer films on Bi{sub 2}Se{sub 3} studied by scanning tunneling microscopy
- Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240 (China)
Ultra-thin Bi films show exotic electronic structure and novel quantum effects, especially the widely studied Bi (111) film. Using reflection high-energy electron diffraction and scanning tunneling microscopy, we studied the structure and morphology evolution of Bi (111) thin films grown on Bi{sub 2}Se{sub 3}. A strongly compressed, but quickly released in-plane lattice of Bi (111) is found in the first three bilayers. The first bilayer of Bi shows a fractal growth mode with flat surface, while the second and third bilayer show a periodic buckling due to the strong compression of the in-plane lattice. The lattice slowly changes to its bulk value with further deposition of Bi.
- OSTI ID:
- 22482114
- Journal Information:
- Applied Physics Letters, Vol. 107, Issue 12; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
Similar Records
Molecular beam epitaxy of bilayer Bi(111) films on topological insulator Bi{sub 2}Te{sub 3}: A scanning tunneling microscopy study
Scanning tunneling microscopy study of the antiferromagnetic topological insulator MnBi2Se4
Electronic structure of antimonene grown on Sb{sub 2}Te{sub 3} (111) and Bi{sub 2}Te{sub 3} substrates
Journal Article
·
Mon Aug 20 00:00:00 EDT 2012
· Applied Physics Letters
·
OSTI ID:22482114
+4 more
Scanning tunneling microscopy study of the antiferromagnetic topological insulator MnBi2Se4
Journal Article
·
Sat Jun 25 00:00:00 EDT 2022
· Physica. E, Low-Dimensional Systems and Nanostructures
·
OSTI ID:22482114
+2 more
Electronic structure of antimonene grown on Sb{sub 2}Te{sub 3} (111) and Bi{sub 2}Te{sub 3} substrates
Journal Article
·
Thu Jan 07 00:00:00 EST 2016
· Journal of Applied Physics
·
OSTI ID:22482114
+7 more