Magnetotransport phenomena in Bi{sub 2}Se{sub 3} thin film topological insulators grown by hybrid physical chemical vapor deposition
- Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States)
- Department of Materials Science and Engineering, Pennsylvania State University, University Park, Pennsylvania 16802 (United States)
Intrinsic defects in Bi{sub 2}Se{sub 3} topological insulators tend to produce a high carrier concentration and current leakage through the bulk material. Bi{sub 2}Se{sub 3} thin films were grown by hybrid physical chemical vapor deposition on (0001) Al{sub 2}O{sub 3} substrates with high Se vapor pressure to reduce the occurrence of Se vacancies as the main type of defect. Consequently, the carrier concentration was reduced to ∼5.75 × 10{sup 18} cm{sup −3} comparable to reported carrier concentration in Bi{sub 2}Se{sub 3} thin films. Magnetotransport measurements were performed on the films and the data were analyzed for weak anti-localization using the Hikami-Larkin-Nagaoka model. The estimated α and l{sub ϕ} values showed good agreement with the symplectic case of 2-D transport of topological surface states in the quantum diffusion regime. The temperature and angular dependence of magnetoresistance indicate a large contribution of the 2-D surface carriers to overall transport properties of Bi{sub 2}Se{sub 3} thin film.
- OSTI ID:
- 22413113
- Journal Information:
- Journal of Applied Physics, Vol. 117, Issue 6; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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