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Title: Enhancement of critical current density in YBa{sub 2}Cu{sub 3}O{sub 7} films using a semiconductor ion implanter

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4906782· OSTI ID:22412994
; ; ; ; ; ;  [1]
  1. National Institute of Advanced Industrial Science and Technology, 3058565 Tsukuba (Japan)

An up-to-11-fold enhancement was observed in the in-magnetic-field critical current density (J{sub c}) in epitaxial YBa{sub 2}Cu{sub 3}O{sub 7} films on CeO{sub 2}-buffered SrTiO{sub 3} substrates by irradiation with 200- to 750-keV Si and 200-keV B ions. This enhancement indicates that ion beams in the range of 100 to 1000 keV, which are widely used for modifying the conductive properties of semiconducting materials, can significantly improve the vortex-pinning properties in second-generation superconducting wires. Also observed was a scaling relation between J{sub c} and the density of the vacancies (i.e., of Frenkel pairs) produced by the nuclear collisions between incident ions and target atoms, suggesting that this density is a key parameter in determining the magnitude of the J{sub c} enhancement. Also observed was an additional J{sub c} enhancement by a modification of the depth distribution of the vacancies, thus demonstrating the flexibility in controlling artificial pinning center (APC) properties in physical APC introduction.

OSTI ID:
22412994
Journal Information:
Journal of Applied Physics, Vol. 117, Issue 4; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English