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A reconfigurable gate architecture for Si/SiGe quantum dots

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4922249· OSTI ID:22412541
; ; ;  [1];  [1]
  1. Department of Physics, Princeton University, Princeton, New Jersey 08544 (United States)

We demonstrate a reconfigurable quantum dot gate architecture that incorporates two interchangeable transport channels. One channel is used to form quantum dots, and the other is used for charge sensing. The quantum dot transport channel can support either a single or a double quantum dot. We demonstrate few-electron occupation in a single quantum dot and extract charging energies as large as 6.6 meV. Magnetospectroscopy is used to measure valley splittings in the range of 35–70 μeV. By energizing two additional gates, we form a few-electron double quantum dot and demonstrate tunable tunnel coupling at the (1,0) to (0,1) interdot charge transition.

OSTI ID:
22412541
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 22 Vol. 106; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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