Improvement of thermal stability of amorphous CoFeSiB thin films
- Department of Electrical and Electronic Engineering, Daido University, Nagoya 457-8530 (Japan)
- Graduate School of Engineering, Mie University, Mie 514-8507 (Japan)
The excellent soft magnetic properties of amorphous (a-) CoFeSiB films make it suited for use in the yoke of granular-in-gap sensors, but only if their thermal stability can be improved. To this end, this study investigated the effects of adding small amounts of other metals on the magnetic and structural properties of a-CoFeSiB films. It was found that adding metals with relatively large atomic radii is an effective way to increase thermal stability, with both Ta and Hf showing good thermal stability after annealing at temperatures of 473 to 573 K. Indeed, a -(CoFeSiB){sub 96.2}Hf{sub 3.8} film was found to maintain its initial coercivity of 0.2 Oe without very little decrease in magnetization after annealing at 623 K. Furthermore, even after annealing at 673 K a -(CoFeSiB){sub 93.0}Hf{sub 7.0} film still had a relatively low coercivity of approximately 0.5 Oe.
- OSTI ID:
- 22403021
- Journal Information:
- Journal of Applied Physics, Vol. 117, Issue 17; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Thermal stability and magnetic properties of Fe-Al-Ga-P-C-B-Si amorphous thick sheets
Evolution of structural and magnetic properties of amorphous CoFeB film with thermal annealing