Formation of a hybrid plasmonic waveguide mode probed by dispersion measurement

Journal Article · Tue Apr 07 00:00:00 EDT 2015 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4916800· OSTI ID:22399375

Saito, H. ^[1]

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1. Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011 (Japan)

Hybrid waveguides, i.e., dielectric waveguides combined with plasmonic waveguides, have great potential for concomitantly exhibiting subwavelength confinement and long range propagation, enabling a highly integrated photonic circuit. We report the characterization of hybrid waveguide modes excited in Si/SiO{sub 2}/Al films, by dispersion measurement using angle-resolved electron energy-loss spectroscopy. This experiment directly verifies the formation of the hybrid waveguide mode with a strongly localized electromagnetic field in a 6-nm-thick SiO{sub 2} layer. The results clearly describe the characteristic behavior of the hybrid waveguide mode, which depends on the effective index of the constituent dielectric waveguide and the surface plasmon-polariton modes.

• OSTI ID: 22399375
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 13 Vol. 117; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ALUMINIUM
DIELECTRIC MATERIALS
ELECTROMAGNETIC FIELDS
ELECTRONS
ENERGY-LOSS SPECTROSCOPY
LAYERS
PLASMONS
POLARONS
PROBES
SILICON
SILICON OXIDES
SURFACES
THIN FILMS
WAVE PROPAGATION
WAVEGUIDES