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Oxygen-induced immediate onset of the antiferromagnetic stacking in thin Cr films on Fe(001)

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4918987· OSTI ID:22398930
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  1. Dipartimento di Fisica, Politecnico di Milano, Piazza Leonardo da Vinci 32, I-20133 Milano (Italy)

We investigated the magnetic coupling of ultra-thin Cr films grown at 600 K on a Fe(001)-p(1 × 1)O substrate by means of spin-polarized photoemission spectroscopy. Our findings show that the expected antiferromagnetic stacking of the magnetization in Cr(001) layers occurs right from the first atomic layer at the Cr/Fe interface. This is at variance with all previous observations in similar systems, prepared in oxygen-free conditions, which always reported on a delayed onset of the magnetic oscillations due to the occurrence of significant chemical alloying at the interface, which is substantially absent in our preparation.

OSTI ID:
22398930
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 16 Vol. 106; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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