Erratum: “High performance solution-deposited amorphous indium gallium zinc oxide thin film transistors by oxygen plasma treatment” [Appl. Phys. Lett. 100, 202106 (2012)]
- Imaging and Characterization Laboratory, King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900 (Saudi Arabia)
No abstract prepared.
- OSTI ID:
- 22395573
- Journal Information:
- Applied Physics Letters, Vol. 105, Issue 24; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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