Role of atomic layer deposited aluminum oxide as oxidation barrier for silicon based materials

Journal Article · Thu Jan 15 04:00:00 EST 2015 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

DOI:https://doi.org/10.1116/1.4904208· OSTI ID:22392115

Fiorentino, Giuseppe; Morana, Bruno ^[1]; Forte, Salvatore ^[2]; Sarro, Pasqualina Maria ^[3]

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1. Department of Microelectronic, Delft University of Technology, Feldmannweg 17, 2628 CT Delft (Netherlands)
2. Department of Electronic, University of Naples Federico II, Piazzale Tecchio, 80125 Napoli (Italy)
3. Department of Microelectronic, Delft University of Technology, Feldmannweg 17, 2628 CT, Delft (Netherlands)

In this paper, the authors study the protective effect against oxidation of a thin layer of atomic layer deposited (ALD) aluminum oxide (Al{sub 2}O{sub 3}). Nitrogen doped silicon carbide (poly-SiC:N) based microheaters coated with ALD Al{sub 2}O{sub 3} are used as test structure to investigate the barrier effect of the alumina layers to oxygen and water vapor at very high temperature (up to 1000 °C). Different device sets have been fabricated changing the doping levels, to evaluate possible interaction between the dopants and the alumina layer. The as-deposited alumina layer morphology has been evaluated by means of AFM analysis and compared to an annealed sample (8 h at 1000 °C) to estimate the change in the grain structure and the film density. The coated microheaters are subjected to very long oxidation time in dry and wet environment (up to 8 h at 900 and 1000 °C). By evaluating the electrical resistance variation between uncoated reference devices and the ALD coated devices, the oxide growth on the SiC is estimated. The results show that the ALD alumina coating completely prevents the oxidation of the SiC up to 900 °C in wet environment, while an oxide thickness reduction of 50% is observed at 1000 °C compared to uncoated devices.

• OSTI ID: 22392115
• Journal Information: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Journal Issue: 1 Vol. 33; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM OXIDES
DOPED MATERIALS
ELECTRIC CONDUCTIVITY
LAYERS
OXIDATION
SILICON CARBIDES
TEMPERATURE RANGE 1000-4000 K
THIN FILMS
WATER VAPOR