Microstructural evaluation of NiTi-based films deposited by magnetron sputtering

Journal Article · Mon Nov 24 04:00:00 EST 2014 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.4903020· OSTI ID:22390744

Mitelea, Ion; Budău, Victor ^[1]; Ercuţa, Aurel ^[2]

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1. Department of Materials and Manufacturing Engineering, Politehnica University of Timisoara (Romania)
2. Department of Materials and Manufacturing Engineering, Politehnica University of Timisoara and Department of Physics, West University Timisoara (Romania)

Shape memory alloy films belonging to the NiTi-based systems were deposited on heated and unheated substrates, by magnetron sputtering in a custom made system, and their structure and composition was analyzed using electron microscopy. Several substrates were used for the depositions: glass, Cu-Zn-Al, Cu-Al-Ni and Ti-NiCu shape memory alloy ribbons and kapton. The composition of the Ti-Ni-Cu films showed limited differences, compared to the one of the target and the microstructure for the DC magnetron sputtering revealed crystallized structure with features determined on peel off samples from a Si wafer. Both inter and transcrystalline fractures were observed and related to the interfacial stress developed on cooling from deposition temperature.

• OSTI ID: 22390744
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1634; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM ALLOYS
COMPARATIVE EVALUATIONS
COPPER ALLOYS
CRYSTAL STRUCTURE
DEPOSITION
ELECTRON MICROSCOPY
FILMS
FRACTURES
METALLIC GLASSES
MICROSTRUCTURE
NICKEL ALLOYS
SHAPE MEMORY EFFECT
SILICON
SPUTTERING
STRESSES
SUBSTRATES
ZINC ALLOYS