Plasmonic nanoring fabrication tuned to pitch: Efficient, deterministic, and large scale realization of ultra-small gaps for next generation plasmonic devices
- Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-University Jena, Max-Wien-Platz 1, 07743 Jena (Germany)
- Institute of Theoretical Solid State Physics, Karlsruher Institut für Technologie, Wolfgang-Gaede-Str. 1, 76128 Karlsruhe (Germany)
- Institute of Condensed Matter Theory and Solid State Optics, Abbe Center of Photonics, Friedrich-Schiller-University Jena, Max-Wien-Platz 1, 07743 Jena (Germany)
A double-patterning process for scalable, efficient, and deterministic nanoring array fabrication is presented. It enables gaps and features below a size of 20 nm. A writing time of 3 min/cm{sup 2} makes this process extremely appealing for scientific and industrial applications. Numerical simulations are in agreement with experimentally measured optical spectra. Therefore, a platform and a design tool for upcoming next generation plasmonic devices like hybrid plasmonic quantum systems are delivered.
- OSTI ID:
- 22351132
- Journal Information:
- Applied Physics Letters, Vol. 105, Issue 14; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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