Enhancement on photocatalytic activity of an amorphous titanium oxide film with nano-textured surface by selective-fluorination etching process
- Institute of Electro-Optical and Materials Science, National Formosa University, Huwei, Yunlin 63201, Taiwan, ROC (China)
- ITRI South, Industrial Technology Research Institute, Liujia, Tainan 73445, Taiwan, ROC (China)
Highlights: • The amorphous TiO{sub x} film surface was modified via selective fluorination etching process. • The resulting nano-textured surface markedly enriched the specific surface area and surface acidity. • The photocatalytic activity was comparable to an annealed TiO{sub x} film with anatase structure. - Abstract: A selective-fluorination etching process achieved by an UV light pre-irradiation and the subsequently fluorination etching was developed to enhance the photocatalytic activity of a low-temperature deposited amorphous titanium oxide (a-TiO{sub x}) film. Textured surface on the a-TiO{sub x} films formed by this process were investigated using atomic force microscope and field emission scanning electron microscope. Evidence of the fluorine ions introduced into the a-TiO{sub x} films was examined using Fourier transform infrared spectrometry and X-ray photoelectron spectroscopy. The etching thickness of the a-TiO{sub x} film was found to be deeply relevant to the film pre-irradiated by the UV light. An a-TiO{sub x} film with nano-textured surface, which was favorable to enlarge the specific surface area, thus was obtainable from the notable etching selectivity of the film pre-irradiated by UV light through a nano-sized mask. In addition, the surface acidity of the a-TiO{sub x} film was enhanced by the formation of the Ti-F chemical bonds originating from the fluorination etching process, which also was functional to facilitate the production of surface OH free radicals. Accordingly, the resulting fluorinated a-TiO{sub x} film with nano-textured surface performed a quality photocatalytic activity comparable to that of the high-temperature achieved TiO{sub x} film with anatase structures.
- OSTI ID:
- 22345273
- Journal Information:
- Materials Research Bulletin, Vol. 52; Other Information: Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA); ISSN 0025-5408
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ATOMIC FORCE MICROSCOPY
DEPOSITS
ETCHING
FIELD EMISSION
FILMS
FLUORIDES
FLUORINATION
FLUORINE IONS
FOURIER TRANSFORMATION
IRRADIATION
NANOSTRUCTURES
PHOTOCATALYSIS
SCANNING ELECTRON MICROSCOPY
SURFACE PROPERTIES
TEXTURE
TITANIUM OXIDES
ULTRAVIOLET RADIATION
X-RAY PHOTOELECTRON SPECTROSCOPY