Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Journal Article · Thu Jan 01 00:00:00 EST 2015 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

DOI:https://doi.org/10.1116/1.4893769· OSTI ID:22317973

Berdova, Maria; Rontu, Ville; Franssila, Sami ^[1]; Ylivaara, Oili M. E.; Puurunen, Riikka L. ^[2]; Törmä, Pekka T. ^[3]

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1. Department of Materials Science and Engineering, Aalto University, P.O. Box 16200, FI-00076 Aalto (Finland)
2. VTT Technical Research Centre of Finland, P.O. Box 1000, FI-02044VTT (Finland)
3. Department of Micro- and Nanosciences, Aalto University, P.O. Box 13500, 00076 Aalto (Finland)

The fracture strength of Al{sub 2}O{sub 3} membranes deposited by atomic layer deposition at 110, 150, 200, and 300 °C was investigated. The fracture strength was found to be in the range of 2.25–3.00 GPa using Weibull statistics and nearly constant as a function of deposition temperature. This strength is superior to common microelectromechanical systems materials such as diamondlike carbon, SiO{sub 2}, or SiC. As-deposited membranes sustained high cycling pressure loads >10 bar/s without fracture. Films featured, however, significant reduction in the resistance to failure after annealing (800 °C) or high humidity (95%, 60 °C) treatments.

• OSTI ID: 22317973
• Journal Information: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 33, Issue 1; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
42 ENGINEERING
ALUMINIUM OXIDES
CARBON
DEPOSITION
FRACTURE PROPERTIES
FRACTURES
MEMBRANES
SILICON CARBIDES
SILICON OXIDES