Two-dimensional electron and hole gases in In{sub x}Ga{sub 1−x}N/Al{sub y}Ga{sub 1−y}N/GaN heterostructure for enhancement mode operation
Journal Article
·
· Journal of Applied Physics
- Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083 (China)
- Beijing Huajin Chuangwei Technology Co., Ltd., Beijing (China)
- Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Beijing (China)
- ISCAS-XJTU Joint Laboratory of Functional Materials and Devices for Informatics, P.O. Box 912, Beijing 100083 (China)
In this paper, a numerical study of In{sub x}Ga{sub 1−x}N/Al{sub y}Ga{sub 1−y}N/GaN heterostructure is presented. The dependence of two-dimensional electron gas (2DEG) and two-dimensional hole gas (2DHG) sheet densities on variables, such as In{sub x}Ga{sub 1−x}N layer thickness and In content, and Al{sub y}Ga{sub 1−y}N barrier layer thickness and Al content, are systematically investigated. The effect of P-type doping in In{sub x}Ga{sub 1−x}N on 2DEG and 2DHG sheet densities in this heterostructure is also studied. It is shown that the strong reverse electric field in In{sub x}Ga{sub 1−x}N cap layer contributes to the depletion of 2DEG at the Al{sub y}Ga{sub 1-y}N/GaN interface. When In{sub x}Ga{sub 1−x}N layer thickness and In content increases, 2DEG sheet density decreases significantly. P-type doping shows less influence on 2DEG compared to the polarization electric field in In{sub x}Ga{sub 1−x}N layer. In addition, there exist critical values for all the variables beyond which 2DHG appears at the interface of In{sub x}Ga{sub 1−x}N/Al{sub y}Ga{sub 1−y}N. Once 2DHG appears, it will prevent 2DEG from being further depleted. With proper design of Al{sub y}Ga{sub 1−y}N layer, the coexistence of 2DEG and 2DHG in In{sub x}Ga{sub 1−x}N/Al{sub y}Ga{sub 1−y}N/GaN structure can be avoided, showing that this structure has great potential in the fabrication of enhancement mode (E-mode) high electron mobility transistors.
- OSTI ID:
- 22314708
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 5 Vol. 116; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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