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Title: The role of stoichiometric vacancy periodicity in pressure-induced amorphization of the Ga{sub 2}SeTe{sub 2} semiconductor alloy

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4892549· OSTI ID:22314483
 [1]; ;  [2];  [3];  [4];  [5];  [1]
  1. Department of Nuclear Engineering, University of California, Berkeley, California 94720 (United States)
  2. Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)
  3. Department of Nuclear Engineering, University of Tennessee, Knoxville, Tennessee 37996 (United States)
  4. Department of Materials Science and Engineering, University of California, Berkeley, California 94720 (United States)
  5. Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)

We observe that pressure-induced amorphization of Ga{sub 2}SeTe{sub 2} (a III-VI semiconductor) is directly influenced by the periodicity of its intrinsic defect structures. Specimens with periodic and semi-periodic two-dimensional vacancy structures become amorphous around 10–11 GPa in contrast to those with aperiodic structures, which amorphize around 7–8 GPa. The result is an instance of altering material phase-change properties via rearrangement of stoichiometric vacancies as opposed to adjusting their concentrations. Based on our experimental findings, we posit that periodic two-dimensional vacancy structures in Ga{sub 2}SeTe{sub 2} provide an energetically preferred crystal lattice that is less prone to collapse under applied pressure. This is corroborated through first-principles electronic structure calculations, which demonstrate that the energy stability of III-VI structures under hydrostatic pressure is highly dependent on the configuration of intrinsic vacancies.

OSTI ID:
22314483
Journal Information:
Applied Physics Letters, Vol. 105, Issue 5; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English