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Title: Exotic exchange bias at epitaxial ferroelectric-ferromagnetic interfaces

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4885316· OSTI ID:22311088
; ; ;  [1]; ;  [2]; ;  [3]; ;  [4];  [5]
  1. Technische Universität München, Physik Department E21, Lehrstuhl für Neutronenstreuung, James-Franck-Straße 1, D-85748 Garching (Germany)
  2. Department of Physics and Astronomy, Uppsala University, Box 516, SE-75120 Uppsala (Sweden)
  3. School of Physics, Institute of Science, and NANOTEC-SUT Center of Excellence on Advanced Functional Nanomaterials, Suranaree University of Technology, Nakhon Ratchasima 30000 (Thailand)
  4. Division of Superconductivity and Magnetism, University of Leipzig, D-04103 Leipzig (Germany)
  5. Laboratory for Neutron Scattering, Paul Scherrer Institut, CH-5232 Villigen (Switzerland)

Multiferroics in spintronics have opened up opportunities for future technological developments, particularly in the field of ferroelectric (FE)-ferromagnetic (FM) oxide interfaces with functionalities. We find strong exchange bias shifts (up to 84 Oe) upon field cooling in metal-oxide (Fe/BaTiO{sub 3}) films combining FM and FE layers. The saturation magnetic moment of the FM layer is also significantly higher than in bulk (3.0 ± 0.2 μ{sub B}/atom) and the reversal mechanism occurs via a domain nucleation process. X-ray absorption spectroscopy at the Fe K-edge and Ba L3-edge indicate presence of few monolayers of antiferromagnetic FeO at the interface without the formation of any BaFeO{sub 3} layer. Polarized neutron reflectometry corroborates with our magnetization data as we perform depth profiling of the magnetic and structural densities in these bilayers. Our first principles density functional calculations support the formation of antiferromagnetic FeO layers at the interface along with an enhancement of Fe magnetic moments in the inner ferromagnetic layers.

OSTI ID:
22311088
Journal Information:
Applied Physics Letters, Vol. 105, Issue 2; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English