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Plasma etching of superconducting Niobium tips for scanning tunneling microscopy

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4887795· OSTI ID:22306252
 [1]; ;  [1]; ; ;  [2]
  1. Laboratory for Physical Sciences, College Park, Maryland 20740 (United States)
  2. Center for Nanophysics and Advanced Materials, Department of Physics, University of Maryland, College Park, Maryland 20742 (United States)

We have developed a reproducible technique for the fabrication of sharp superconducting Nb tips for scanning tunneling microscopy (STM) and scanning tunneling spectroscopy. Sections of Nb wire with 250 μm diameter are dry etched in an SF₆ plasma in a Reactive Ion Etcher. The gas pressure, etching time, and applied power are chosen to control the ratio of isotropic to anisotropic etch rates and produce the desired tip shape. The resulting tips are atomically sharp, with radii of less than 100 nm, mechanically stable, and superconducting. They generate good STM images and spectroscopy on single crystal samples of Au(111), Au(100), and Nb(100), as well as a doped topological insulator Bi₂Se₃ at temperatures ranging from 30 mK to 9 K.

OSTI ID:
22306252
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 1 Vol. 116; ISSN JAPIAU; ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English

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