Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography

Journal Article · Wed May 28 04:00:00 EDT 2014 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4876298· OSTI ID:22304383

Xu, Jia; Zhang, Ziang; Weng, Zhankun ^[1]; Wang, Zuobin; Wang, Dapeng ^[1]

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1. CNM and JR3CN, Changchun University of Science and Technology, Changchun 130022 (China)

This paper presents a new method for the generation of cross-scale laser interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam laser interference lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam laser interference lithography setup. The theoretical and experimental results have shown that direct six-beam laser interference lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications.

• OSTI ID: 22304383
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 20 Vol. 115; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
DISTRIBUTION
INCIDENCE ANGLE
INTERFERENCE
LASER RADIATION
PERIODICITY
RADIANT FLUX DENSITY
SILICON
SURFACES
WAVELENGTHS