Diffraction-assisted micropatterning of silicon surfaces by ns-laser irradiation
Journal Article
·
· Journal of Applied Physics
- Departamento de Física, Universidad Autónoma Metropolitana Iztapalapa, Av. San Rafael Atlixco No. 186, Col. Vicentina, C.P. 09340 México D. F. (Mexico)
- Departamento de Química, Universidad Autónoma Metropolitana Iztapalapa, Av. San Rafael Atlixco No. 186, Col. Vicentina, C.P. 09340 México D. F. (Mexico)
- BAM Bundesanstalt für Materialforschung und-prüfung, Unter den Eichen 87, D-12205 Berlin (Germany)
Single-pulse (532 nm, 8 ns) micropatterning of silicon with nanometric surface modulation is demonstrated by irradiating through a diffracting pinhole. The irradiation results obtained at fluences above the melting threshold are characterized by scanning electron and scanning force microscopy and reveal a good agreement with Fresnel diffraction theory. The physical mechanism is identified and discussed on basis of both thermocapillary and chemicapillary induced material transport during the molten state of the surface.
- OSTI ID:
- 22304126
- Journal Information:
- Journal of Applied Physics, Vol. 115, Issue 22; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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