Tuning the work function of graphene by nitrogen plasma treatment with different radio-frequency powers

Journal Article · Mon Jun 09 00:00:00 EDT 2014 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4882159· OSTI ID:22300050

Zeng, Jian-Jhou; Lin, Yow-Jon ^[1]

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1. Institute of Photonics, National Changhua University of Education, Changhua 500, Taiwan (China)

Graphene prepared by the chemical vapor deposition method was treated with nitrogen plasma under different radio-frequency (rf) power conditions in order to experimentally study the change in the work function. Control of the rf power could change the work function of graphene from 4.91 eV to 4.37 eV. It is shown that the increased rf power may lead to the increased number of graphitic nitrogen, increasing the electron concentration, and shifting the Fermi level to higher energy. The ability to controllably tune the work function of graphene is essential for optimizing the efficiency of optoelectronic and electronic devices.

• OSTI ID: 22300050
• Journal Information: Applied Physics Letters, Vol. 104, Issue 23; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
77 NANOSCIENCE AND NANOTECHNOLOGY
CHEMICAL VAPOR DEPOSITION
EFFICIENCY
ELECTRONIC EQUIPMENT
EV RANGE
FERMI LEVEL
GRAPHENE
GRAPHITE
NITROGEN
OPTIMIZATION
PLASMA
RADIOWAVE RADIATION
WORK FUNCTIONS