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Stress and Curvature Effects in Layered 2D Ferroelectric CuInP2S6

Journal Article · · ACS Nano
 [1];  [2];  [3];  [3];  [4];  [5];  [5];  [6]
  1. Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States); Penn State
  2. National Academy of Sciences of Ukraine (NASU), Kyiv (Ukraine)
  3. Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
  4. National Academy of Sciences of Ukraine, Kyiv (Ukraine)
  5. Pennsylvania State Univ., University Park, PA (United States)
  6. University of Tennessee, Knoxville, TN (United States)

Nanoscale ferroelectric 2D materials offer the opportunity to investigate curvature and strain effects on materials functionalities. Among these, CuInP2S6 (CIPS) has attracted tremendous research interest in recent years due to combination of room temperature ferroelectricity, scalability to a few layers thickness, and ferrielectric properties due to coexistence of 2 polar sublattices. Here, we explore the local curvature and strain effect on polarization in CIPS via piezoresponse force microscopy and spectroscopy. To explain the observed behaviors and decouple the curvature and strain effects in 2D CIPS, we introduce the finite element Landau–Ginzburg–Devonshire model, revealing strong changes in hysteresis characteristics in regions subjected to tensile and compressive strain. The piezoresponse force microscopy (PFM) results show that bending induces ferrielectric domains in CIPS, and the polarization-voltage hysteresis loops differ in bending and nonbending regions. Furthermore, these studies offer insights into the fabrication of curvature-engineered nanoelectronic devices.

Research Organization:
Pennsylvania State Univ., University Park, PA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF)
Grant/Contract Number:
SC0021118
OSTI ID:
2229373
Alternate ID(s):
OSTI ID: 2326314
Journal Information:
ACS Nano, Journal Name: ACS Nano Journal Issue: 21 Vol. 17; ISSN 1936-0851
Publisher:
American Chemical Society (ACS)Copyright Statement
Country of Publication:
United States
Language:
English

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