A study on the evolution of dielectric function of ZnO thin films with decreasing film thickness
Journal Article
·
· Journal of Applied Physics
- School of Electrical and Electronic Engineering, Nanyang Technological University, 639798 Singapore (Singapore)
- State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology, Chengdu 610054 (China)
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006 (China)
- GLOBALFOUNDRIES Singapore Pte Ltd, 738406 Singapore (Singapore)
Dielectric function, band gap, and exciton binding energies of ultrathin ZnO films as a function of film thickness have been obtained with spectroscopic ellipsometry. As the film thickness decreases, both real (ε{sub 1}) and imaginary (ε{sub 2}) parts of the dielectric function decrease significantly, and ε{sub 2} shows a blue shift. The film thickness dependence of the dielectric function is shown related to the changes in the interband absorption, discrete-exciton absorption, and continuum-exciton absorption, which can be attributed to the quantum confinement effect on both the band gap and exciton binding energies.
- OSTI ID:
- 22277898
- Journal Information:
- Journal of Applied Physics, Vol. 115, Issue 10; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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