Flow strength of tantalum under ramp compression to 250 GPa
- Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)
- Sandia National Laboratories, Livermore, California 94450 (United States)
- Lawrence Livermore National Laboratories, Livermore, California 94550 (United States)
A magnetic loading technique was used to study the strength of polycrystalline tantalum ramp compressed to peak stresses between 60 and 250 GPa. Velocimetry was used to monitor the planar ramp compression and release of various tantalum samples. A wave profile analysis was then employed to determine the pressure-dependence of the average shear stress upon unloading at strain rates on the order of 10{sup 5} s{sup −1}. Experimental uncertainties were quantified using a Monte Carlo approach, where values of 5% in the estimated pressure and 9–17% in the shear stress were calculated. The measured deviatoric response was found to be in good agreement with existing lower pressure strength data as well as several strength models. Significant deviations between the experiments and models, however, were observed at higher pressures where shear stresses of up to 5 GPa were measured. Additionally, these data suggest a significant effect of the initial material processing on the high pressure strength. Heavily worked or sputtered samples were found to support up to a 30% higher shear stress upon release than an annealed material.
- OSTI ID:
- 22275826
- Journal Information:
- Journal of Applied Physics, Vol. 115, Issue 4; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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