Structural evolution and photoluminescence of annealed Si-rich nitride with Si quantum dots prepared by plasma enhanced chemical vapor deposition
Journal Article
·
· Journal of Applied Physics
- School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, Hubei 430074 (China)
Silicon-rich nitride films were deposited by plasma enhanced chemical vapor deposition. Silicon quantum dots (Si QDs) were formed by post-thermal annealing processing verified using the High-Resolution Transmission Electron Microscope. The 1100 °C thermal annealing leads to the nucleation of silicon atoms, the growth of Si QDs, and the rearrangement of Si 2p and N 1s elements. The structural evolution of silicon-rich nitride thin film with post annealing promotes the formation of Si QDs and Si{sub 3}N{sub 4} matrix. We also investigated the effect of the NH{sub 3}-to-SiH{sub 4} ratio R on the photoluminescence (PL) of SiN{sub x} with Si QDs. We found that the broad blue luminescence originates from both quantum confined effect and radiative defects. The intensity of the PL was changed by adjusting the NH{sub 3} flow rate. The increase of R could limit the transformation of Si QDs from amorphous to crystalline status, meanwhile lead to the alteration of distribution of defect states. These can help to understand the annealing-dependent characteristics, the PL mechanisms of silicon-rich nitride and to optimize the fabrication process of Si QDs embedded in nitride.
- OSTI ID:
- 22273550
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 15 Vol. 115; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Si quantum dots in silicon nitride: Quantum confinement and defects
Effect of hydrogen passivation on charge storage in silicon quantum dots embedded in silicon nitride film
The role of N-Si-O bonding configurations in tunable photoluminescence of oxygenated amorphous silicon nitride films
Journal Article
·
Sun Dec 13 23:00:00 EST 2015
· Journal of Applied Physics
·
OSTI ID:22493025
Effect of hydrogen passivation on charge storage in silicon quantum dots embedded in silicon nitride film
Journal Article
·
Mon Apr 04 00:00:00 EDT 2005
· Applied Physics Letters
·
OSTI ID:20637076
The role of N-Si-O bonding configurations in tunable photoluminescence of oxygenated amorphous silicon nitride films
Journal Article
·
Mon Jun 08 00:00:00 EDT 2015
· Applied Physics Letters
·
OSTI ID:22423748