Preparation of Cu-doped nickel oxide thin films and their properties
Journal Article
·
· AIP Conference Proceedings
- School of Physics, Alagappa University, Karaikudi-630004 (India)
Copper doped Nickel oxide film was preferred on glass substrate by simple nebulizer technique keeping the substrate temperature at 350°C and characterized by X-ray diffraction (XRD), Photoluminescence (PL) and Four probe resistivity measurements. XRD studies indicated cubic structure and the crystallites are preferentially oriented along the [111] direction. Interesting results have been obtained from the study of PL spectra. A peak corresponding to 376nm in the emission spectra for 0%, 5% and 10% copper doped samples. The samples show sharp and strong UV emission corresponding to the near band edge emission under excitation of 275nm.
- OSTI ID:
- 22271049
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1591; ISSN APCPCS; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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