Fabrication of highly spin-polarized Co{sub 2}FeAl{sub 0.5}Si{sub 0.5} thin-films

Journal Article · Tue Apr 01 00:00:00 EDT 2014 · APL Materials

DOI:https://doi.org/10.1063/1.4869798· OSTI ID:22269537

Vahidi, M.; Zhang, S. K.; Yu, L.; Huang, M.; Gifford, J. A.; Chen, T. Y. ^[1]; Krishnamurthy, S.; Yu, Z. G. ^[2]; Youngbull, C. ^[3]

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1. Department of Physics, Arizona State University, Tempe, Arizona 85287 (United States)
2. SRI International, 301-64, Menlo Park, California 94025 (United States)
3. The Biodesign Institute, Arizona State University, Tempe, Arizona 85287 (United States)

Ferromagnetic Heusler Co{sub 2}FeAl{sub 0.5}Si{sub 0.5} epitaxial thin-films have been fabricated in the L2{sub 1} structure with saturation magnetizations over 1200 emu/cm{sup 3}. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.

• OSTI ID: 22269537
• Journal Information: APL Materials, Vol. 2, Issue 4; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 2166-532X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANNEALING
DEPOSITS
EPITAXY
FABRICATION
MAGNESIUM OXIDES
MAGNETIZATION
SATURATION
SPIN ORIENTATION
SPUTTERING
SUBSTRATES
TEMPERATURE RANGE 0400-1000 K
THIN FILMS