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Title: Giant amplification of tunnel magnetoresistance in a molecular junction: Molecular spin-valve transistor

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4873396· OSTI ID:22262568
;  [1]
  1. Department of Physics, Michigan Technological University, Houghton, Michigan 49931 (United States)

Amplification of tunnel magnetoresistance by gate field in a molecular junction is the most important requirement for the development of a molecular spin valve transistor. Herein, we predict a giant amplification of tunnel magnetoresistance in a single molecular spin valve junction, which consists of Ru-bis-terpyridine molecule as a spacer between two ferromagnetic nickel contacts. Based on the first-principles quantum transport approach, we show that a modest change in the gate field that is experimentally accessible can lead to a substantial amplification (320%) of tunnel magnetoresistance. The origin of such large amplification is attributed to the spin dependent modification of orbitals at the molecule-lead interface and the resultant Stark effect induced shift in channel position with respect to the Fermi energy.

OSTI ID:
22262568
Journal Information:
Applied Physics Letters, Vol. 104, Issue 16; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English