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Structure in multilayer films of zinc sulfide and copper sulfide via atomic layer deposition

Journal Article · · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
DOI:https://doi.org/10.1116/1.4847956· OSTI ID:22258662
; ; ; ; ; ;  [1]
  1. Department of Physics, University of California at Santa Cruz, 1156 High Street, Santa Cruz, California 95064 (United States)
Multilayer film stacks of ZnS and Cu{sub x}S (x ∼ 2) were made via atomic layer deposition. The precursors were bis(2,2,6,6-tetramethyl-3,5-heptanedionato)zinc, bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper, and H{sub 2}S generated in situ for sulfur. Samples were deposited at 200 °C, in layers ranging from approximately 2 to 20 nm thick, based on binary growth rates. The properties of the film stacks were studied with atomic force microscopy, ultraviolet–visible spectroscopy, and extended x-ray absorption fine structure. The results demonstrate that the structure of films with the thinnest layers is dominated by Cu{sub x}S, whereas in the thicker films, the structure is determined by whichever material is first deposited. This can be attributed to the crystal structure mismatch of ZnS and Cu{sub x}S.
OSTI ID:
22258662
Journal Information:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Journal Issue: 1 Vol. 32; ISSN 0734-2101; ISSN JVTAD6
Country of Publication:
United States
Language:
English

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