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Reconfigurable p-n junction diodes and the photovoltaic effect in exfoliated MoS{sub 2} films

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4870067· OSTI ID:22258586
; ; ; ;  [1]
  1. National Institute of Materials Science, 1-2-1 Sengen, Tsukuba-city, Ibaraki 305-0047 (Japan)
Realizing basic semiconductor devices such as p-n junctions are necessary for developing thin-film and optoelectronic technologies in emerging planar materials such as MoS{sub 2}. In this work, electrostatic doping by buried gates is used to study the electronic and optoelectronic properties of p-n junctions in exfoliated MoS{sub 2} flakes. Creating a controllable doping gradient across the device leads to the observation of the photovoltaic effect in monolayer and bilayer MoS{sub 2} flakes. For thicker flakes, strong ambipolar conduction enables realization of fully reconfigurable p-n junction diodes with rectifying current-voltage characteristics, and diode ideality factors as low as 1.6. The spectral response of the photovoltaic effect shows signatures of the predicted band gap transitions. For the first excitonic transition, a shift of >4{sub kB}T is observed between monolayer and bulk devices, indicating a thickness-dependence of the excitonic coulomb interaction.
OSTI ID:
22258586
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 12 Vol. 104; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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