Recent development of RIKEN 28 GHz superconducting electron cyclotron resonance ion source

Journal Article · Sat Feb 15 04:00:00 EST 2014 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4848976· OSTI ID:22253584

Ohnishi, J.; Ozeki, K.; Kidera, M.; Nakagawa, T. ^[1]

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1. RIKEN, 2-1 Hirosawa, Wako, Saitama (Japan)

Over the past two years, we have tried to improve the performance of the RIKEN superconducting electron cyclotron resonance ion source using several methods. For the production of U vapor, we chose the sputtering method because it is possible to install a large amount of material inside the plasma chamber and thus achieve long-term operation without a break, although it is assumed that the beam intensity is weaker than in the oven technique. We also used an aluminum chamber instead of a stainless steel one. Using these methods, we successfully produced ∼180 eμA of U{sup 35+} and ∼230 eμA of U{sup 33+} at the injected radio frequency (RF) power of ∼4 kW (28 GHz). Very recently, to further increase the beam intensity of U{sup 35+}, we have started to develop a high temperature oven and have successfully produced a highly charged U ion beam. In this contribution, we report on the beam intensity of highly charged U ions as a function of various parameters (RF power and sputtering voltage) and discuss the effects of these parameters on the beam stability in detail.

• OSTI ID: 22253584
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 2 Vol. 85; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
43 PARTICLE ACCELERATORS
ALUMINIUM
ECR ION SOURCES
ELECTRIC POTENTIAL
GHZ RANGE 01-100
RADIOWAVE RADIATION
SPUTTERING
STAINLESS STEELS
URANIUM IONS
VAPORS