In situ dc oxygen‐discharge cleaning system for optical elements
- Photon Factory, National Laboratory for High Energy Physics, 1‐1 Oho, Tsukuba‐shi, Ibaraki‐ken 305 (Japan)
In situ dc oxygen‐discharge cleaning arrangements have been developed at the Photon Factory for the removal of carbon contamination from optical surfaces. A high cleaning rate could be achieved by producing an oxygen plasma close to the optical elements with special care taken to avoid any harmful effects from the discharge; contaminant carbon was completely removed within a few hours, at most. This short exposure time and the use of dry oxygen gas resulted in a restoration of the original ultrahigh vacuum without a bakeout. Results with a Seya‐Namioka beamline for gas‐phase experiments showed a flux enhancement amounting to a factor of 50, and results with a grasshopper beamline showed a nearly complete recovery of the light intensity, even at the carbon K edge.
- OSTI ID:
- 22251350
- Journal Information:
- Review of Scientific Instruments, Vol. 60, Issue 7; Conference: International conference on synchrotron radiation instrumentation, Tsukuba (Japan), 29 Aug - 2 Sep 1988; Other Information: (c) 1989 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
Similar Records
In situ reactive glow discharge cleaning of x-ray optical surfaces
In-situ reactive glow discharge cleaning of NSLS distributed ion pumps