Note: Mechanical etching of atomic force microscope tip and microsphere attachment for thermal radiation scattering enhancement

Journal Article · Sun Dec 15 00:00:00 EST 2013 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4849575· OSTI ID:22251221

Brissinger, D.; Lacroix, D. ^[1]

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1. Université de Lorraine, LEMTA, UMR 7563, BP70239, 54500 Vandoeuvre-lés-Nancy (France)

This Note describes a mechanical etching technique which can be used to prepare silicon tips used in atomic force microscopy apparatus. For such devices, dedicated tips with specific shapes are now commonly used to probe surfaces. Yet, the control of the tip morphology where characteristic scales are lower than 1 μm remains a real challenge. Here, we detail a controlled etching process of AFM probes apex allowing micrometer-sized sphere attachment. The technique used and influent parameters are discussed and SEM images of the achieved tips are given. Deceptive problems and drawbacks that might occur during the process are also covered.

• OSTI ID: 22251221
• Journal Information: Review of Scientific Instruments, Vol. 84, Issue 12; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ATOMIC FORCE MICROSCOPY
ETCHING
IMAGES
MORPHOLOGY
PROBES
SCANNING ELECTRON MICROSCOPY
SCATTERING
SILICON
THERMAL RADIATION