skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Ion optical effects in a low pressure rf plasma

Journal Article · · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
DOI:https://doi.org/10.1116/1.4823104· OSTI ID:22224107
;  [1]
  1. Institute for Surface and Thin Film Analysis IFOS and Department of Physics, Technical University of Kaiserslautern, D-67663 Kaiserslautern (Germany)

Ion optical effects in low pressure gas discharges are introduced as a novel input into low pressure plasma technology. They are based on appropriate geometrical plasma confinements which enable a control of the shape of internal density and potential distributions and, hence, the ion motion in the plasma bulk. Such effects are exemplified for an electron cyclotron wave resonance plasma in Ar at 1–5 × 10{sup −3} millibars. The geometry of the plasma chamber is modified by a conical and a cylindrical insert. Computer simulations display spherical plasma density contours to be formed around the conical confinement. This effects an increase of the ratio of the ion currents into the conical and the cylindrical inserts which depends on the fourth power of the plasma electron temperature. A quantitative understanding of this behavior is presented. As another essential result, the shape of the internal plasma contours is found to be independent of the pressure controlled plasma parameters.

OSTI ID:
22224107
Journal Information:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 31, Issue 6; Other Information: (c) 2013 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
Country of Publication:
United States
Language:
English