Immobilization of [60]fullerene on silicon surfaces through a calix[8]arene layer

Journal Article · Mon Oct 28 04:00:00 EDT 2013 · Journal of Chemical Physics

DOI:https://doi.org/10.1063/1.4827114· OSTI ID:22220375

Busolo, Filippo; Silvestrini, Simone; Maggini, Michele ^[1]; Armelao, Lidia ^[2]

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1. Department of Chemical Sciences, ITM-CNR University of Padova, Via F. Marzolo 1, 35131 Padova (Italy)
2. Department of Chemical Sciences, IENI-CNR and INSTM, University of Padova, Via F. Marzolo 1, 35131 Padova (Italy)

In this work, we report the functionalization of flat Si(100) surfaces with a calix[8]arene derivative through a thermal hydrosilylation process, followed by docking with [60]fullerene. Chemical grafting of calix[8]arene on silicon substrates was evaluated by X-ray photoelectron spectroscopy, whereas host-guest immobilization of fullerene was demonstrated by atomic force microscopy and sessile drop water contact angle measurements. Surface topographical variations, modelled on the basis of calix[8]arene and [60]fullerene geometrical parameters, are consistent with the observed morphological features relative to surface functionalization and to non-covalent immobilization of [60]fullerene.

• OSTI ID: 22220375
• Journal Information: Journal of Chemical Physics, Journal Name: Journal of Chemical Physics Journal Issue: 16 Vol. 139; ISSN JCPSA6; ISSN 0021-9606
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
77 NANOSCIENCE AND NANOTECHNOLOGY
ATOMIC FORCE MICROSCOPY
CALIXARENES
FULLERENES
LAYERS
SEMICONDUCTOR MATERIALS
SILICON
SUBSTRATES
SURFACE TREATMENTS
SURFACES
X-RAY PHOTOELECTRON SPECTROSCOPY