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Ultra-shallow quantum dots in an undoped GaAs/AlGaAs two-dimensional electron gas

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4795613· OSTI ID:22162786
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  1. Cavendish Laboratory, University of Cambridge, Cambridge (United Kingdom)
  2. School of Physics, University of New South Wales, Sydney (Australia)

We report quantum dots fabricated on very shallow 2-dimensional electron gases, only 30 nm below the surface, in undoped GaAs/AlGaAs heterostructures grown by molecular beam epitaxy. Due to the absence of dopants, an improvement of more than one order of magnitude in mobility (at 2 Multiplication-Sign 10{sup 11} cm{sup -2}) with respect to doped heterostructures with similar depths is observed. These undoped wafers can easily be gated with surface metallic gates patterned by e-beam lithography, as demonstrated here from single-level transport through a quantum dot showing large charging energies (up to 1.75 meV) and excited state energies (up to 0.5 meV).

OSTI ID:
22162786
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 10 Vol. 102; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English