In situ focus characterization by ablation technique to enable optics alignment at an XUV FEL source
- Deutsches Electronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg (Germany)
- Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 18221 Prague (Czech Republic)
In situ focus characterization is demonstrated by working at an extreme ultraviolet (XUV) free-electron laser source using ablation technique. Design of the instrument reported here allows reaching a few micrometres resolution along with keeping the ultrahigh vacuum conditions and ensures high-contrast visibility of ablative imprints on optically transparent samples, e.g., PMMA. This enables on-line monitoring of the beam profile changes and thus makes possible in situ alignment of the XUV focusing optics. A good agreement between focal characterizations retrieved from in situ inspection of ablative imprints contours and from well-established accurate ex situ analysis with Nomarski microscope has been observed for a typical micro-focus experiment.
- OSTI ID:
- 22118656
- Journal Information:
- Review of Scientific Instruments, Vol. 84, Issue 6; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
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