Effect of ammonia plasma treatment on graphene oxide LB monolayers
- Department of Physics, Indian Institute of Technology Bombay, Mumbai - 400076 (India)
- Department of Metallurgical Engineering and Materials Science, Indian Institute of Technology Bombay, Mumbai - 400076 (India)
Graphene oxide monolayer sheets were transferred on Si and SiO{sub 2}/Si substrates by Langmuir-Blodgett technique and were exposed to ammonia plasma at room temperature. The monolayer character of both graphene oxide and plasma treated graphene oxide sheets were ascertained by atomic force microscopy. X-ray photoelectron spectroscopy and Raman spectroscopy revealed that ammonia plasma treatment results in enhancement of graphitic carbon content along with the incorporation of nitrogen. The conductivity of graphene oxide monolayers, which was in the range of 10{sup -6}-10{sup -7} S/cm, increased to 10{sup -2}-10{sup -3} S/cm after the ammonia plasma treatment. These results indicate that the graphene oxide was simultaneously reduced and N-doped during ammonia plasma treatment, without affecting the morphological stability of sheets.
- OSTI ID:
- 22116020
- Journal Information:
- AIP Conference Proceedings, Vol. 1512, Issue 1; Conference: 57. DAE solid state physics symposium 2012, Mumbai (India), 3-7 Dec 2012; Other Information: (c) 2013 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AMMONIA
ATOMIC FORCE MICROSCOPY
DOPED MATERIALS
GRAPHENE
GRAPHITE
NITROGEN
PHASE STABILITY
PLASMA
RAMAN SPECTRA
RAMAN SPECTROSCOPY
SILICON
SILICON OXIDES
SUBSTRATES
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
X-RAY PHOTOELECTRON SPECTROSCOPY