An instrument for 3D x-ray nano-imaging

Journal Article · Sun Jul 15 00:00:00 EDT 2012 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4737624· OSTI ID:22093667

Holler, M.; Raabe, J.; Diaz, A.; Guizar-Sicairos, M.; Quitmann, C.; Menzel, A.; Bunk, O. ^[1]

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1. Paul Scherrer Institut, 5232 Villigen PSI (Switzerland)

We present an instrument dedicated to 3D scanning x-ray microscopy, allowing a sample to be precisely scanned through a beam while the angle of x-ray incidence can be changed. The position of the sample is controlled with respect to the beam-defining optics by laser interferometry. The instrument achieves a position stability better than 10 nm standard deviation. The instrument performance is assessed using scanning x-ray diffraction microscopy and we demonstrate a resolution of 18 nm in 2D imaging of a lithographic test pattern while the beam was defined by a pinhole of 3 {mu}m in diameter. In 3D on a test object of copper interconnects of a microprocessor, a resolution of 53 nm is achieved.

• OSTI ID: 22093667
• Journal Information: Review of Scientific Instruments, Vol. 83, Issue 7; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
BEAMS
INTERFEROMETRY
MICROPROCESSORS
MICROSCOPY
PERFORMANCE
STABILITY
X RADIATION
X-RAY DIFFRACTION