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Title: Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

Abstract

This paper reports on an investigation of the hybrid pulsed sputtering source based on the combination of electron cyclotron wave resonance (ECWR) inductively coupled plasma and high power impulse magnetron sputtering (HiPIMS) of a Ti target. The plasma source, operated in an Ar atmosphere at a very low pressure of 0.03 Pa, provides plasma where the major fraction of sputtered particles is ionized. It was found that ECWR assistance increases the electron temperature during the HiPIMS pulse. The discharge current and electron density can achieve their stable maximum 10 {mu}s after the onset of the HiPIMS pulse. Further, a high concentration of double charged Ti{sup ++} with energies of up to 160 eV was detected. All of these facts were verified experimentally by time-resolved emission spectroscopy, retarding field analyzer measurement, Langmuir probe, and energy-resolved mass spectrometry.

Authors:
 [1];  [2]; ; ; ;  [1]; ;  [3];  [4]
  1. Ernst-Moritz-Arndt-Universitaet Greifswald, Institut fuer Physik, Felix-Hausdorff-Str. 6, 17489 Greifswald (Germany)
  2. (Czech Republic)
  3. Institute of Physics v. v. i., Academy of Science of the Czech Republic, Na Slovance 2, 182 21 Prague (Czech Republic)
  4. Charles University in Prague, Faculty of Mathematics and Physics, V Holesovickach 2, 180 00 Prague (Czech Republic)
Publication Date:
OSTI Identifier:
22089559
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 112; Journal Issue: 9; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; CYCLOTRONS; ELECTRON DENSITY; ELECTRON TEMPERATURE; EMISSION SPECTROSCOPY; ION TEMPERATURE; LANGMUIR PROBE; MAGNETRONS; MASS SPECTROSCOPY; PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA PRESSURE; RESONANCE; RF SYSTEMS; TIME RESOLUTION; TITANIUM IONS

Citation Formats

Stranak, Vitezslav, University of South Bohemia, Institute of Physics and Biophysics, Branisovska 31, 370 05 Ceske Budejovice, Herrendorf, Ann-Pierra, Drache, Steffen, Bogdanowicz, Robert, Hippler, Rainer, Cada, Martin, Hubicka, Zdenek, and Tichy, Milan. Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma. United States: N. p., 2012. Web. doi:10.1063/1.4764102.
Stranak, Vitezslav, University of South Bohemia, Institute of Physics and Biophysics, Branisovska 31, 370 05 Ceske Budejovice, Herrendorf, Ann-Pierra, Drache, Steffen, Bogdanowicz, Robert, Hippler, Rainer, Cada, Martin, Hubicka, Zdenek, & Tichy, Milan. Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma. United States. doi:10.1063/1.4764102.
Stranak, Vitezslav, University of South Bohemia, Institute of Physics and Biophysics, Branisovska 31, 370 05 Ceske Budejovice, Herrendorf, Ann-Pierra, Drache, Steffen, Bogdanowicz, Robert, Hippler, Rainer, Cada, Martin, Hubicka, Zdenek, and Tichy, Milan. Thu . "Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma". United States. doi:10.1063/1.4764102.
@article{osti_22089559,
title = {Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma},
author = {Stranak, Vitezslav and University of South Bohemia, Institute of Physics and Biophysics, Branisovska 31, 370 05 Ceske Budejovice and Herrendorf, Ann-Pierra and Drache, Steffen and Bogdanowicz, Robert and Hippler, Rainer and Cada, Martin and Hubicka, Zdenek and Tichy, Milan},
abstractNote = {This paper reports on an investigation of the hybrid pulsed sputtering source based on the combination of electron cyclotron wave resonance (ECWR) inductively coupled plasma and high power impulse magnetron sputtering (HiPIMS) of a Ti target. The plasma source, operated in an Ar atmosphere at a very low pressure of 0.03 Pa, provides plasma where the major fraction of sputtered particles is ionized. It was found that ECWR assistance increases the electron temperature during the HiPIMS pulse. The discharge current and electron density can achieve their stable maximum 10 {mu}s after the onset of the HiPIMS pulse. Further, a high concentration of double charged Ti{sup ++} with energies of up to 160 eV was detected. All of these facts were verified experimentally by time-resolved emission spectroscopy, retarding field analyzer measurement, Langmuir probe, and energy-resolved mass spectrometry.},
doi = {10.1063/1.4764102},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 9,
volume = 112,
place = {United States},
year = {2012},
month = {11}
}