Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma
- Ernst-Moritz-Arndt-Universitaet Greifswald, Institut fuer Physik, Felix-Hausdorff-Str. 6, 17489 Greifswald (Germany)
- Institute of Physics v. v. i., Academy of Science of the Czech Republic, Na Slovance 2, 182 21 Prague (Czech Republic)
- Charles University in Prague, Faculty of Mathematics and Physics, V Holesovickach 2, 180 00 Prague (Czech Republic)
This paper reports on an investigation of the hybrid pulsed sputtering source based on the combination of electron cyclotron wave resonance (ECWR) inductively coupled plasma and high power impulse magnetron sputtering (HiPIMS) of a Ti target. The plasma source, operated in an Ar atmosphere at a very low pressure of 0.03 Pa, provides plasma where the major fraction of sputtered particles is ionized. It was found that ECWR assistance increases the electron temperature during the HiPIMS pulse. The discharge current and electron density can achieve their stable maximum 10 {mu}s after the onset of the HiPIMS pulse. Further, a high concentration of double charged Ti{sup ++} with energies of up to 160 eV was detected. All of these facts were verified experimentally by time-resolved emission spectroscopy, retarding field analyzer measurement, Langmuir probe, and energy-resolved mass spectrometry.
- OSTI ID:
- 22089559
- Journal Information:
- Journal of Applied Physics, Vol. 112, Issue 9; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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