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Phase change behaviors of Zn-doped Ge{sub 2}Sb{sub 2}Te{sub 5} films

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4742144· OSTI ID:22089326
;  [1]; ; ; ;  [2];  [3];  [4]
  1. Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083 (China)
  2. Faculty of Information Science and Engineering, Ningbo University, Ningbo 315211 (China)
  3. Laser Physics Centre, Australian National University, Canberra, ACT 0200 (Australia)
  4. Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China)
Zn-doped Ge{sub 2}Sb{sub 2}Te{sub 5} phase-change materials have been investigated for phase change memory applications. Zn{sub 15.16}(Ge{sub 2}Sb{sub 2}Te{sub 5}){sub 84.84} phase change film exhibits a higher crystallization temperature ({approx}258 Degree-Sign C), wider band gap ({approx}0.78 eV), better data retention of 10 years at 167.5 Degree-Sign C, higher crystalline resistance, and faster crystallization speed compared with the conventional Ge{sub 2}Sb{sub 2}Te{sub 5}. The proper Zn atom added into Ge{sub 2}Sb{sub 2}Te{sub 5} serves as a center for suppression of the face-centered-cubic (fcc) phase to hexagonal close-packed (hcp) phase transition, and fcc phase has high thermal stability partially due to the bond recombination among Zn, Sb, and Te atoms.
OSTI ID:
22089326
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 5 Vol. 101; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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