Nanopatterning by Area-Selective Atomic Layer Deposition
book
November 2011
Inherently Area‐Selective Atomic Layer Deposition of SiO 2 Thin Films to Confer Oxide Versus Nitride Selectivity
journal
June 2021
Sequential Regeneration of Self-Assembled Monolayers for Highly Selective Atomic Layer Deposition
journal
September 2016
The Effect of Surface Terminations on the Initial Stages of TiO2 Deposition on Functionalized Silicon
journal
January 2023
N -Iodosuccinimide (NIS) in Direct Aromatic Iodination: N -Iodosuccinimide (NIS) in Direct Aromatic Iodination
journal
May 2017
Size independent blue luminescence in nitrogen passivated silicon nanocrystals: Size independent blue luminescence
journal
September 2012
Analysis of polymer surfaces by SIMS 1. An investigation of practical problems
journal
June 1982
Morphology of hydrogen-terminated Si(111) and Si(100) surfaces upon etching in HF and buffered-HF solutions
journal
May 1992
Covalent bonding of thiophenes to Si(111) by a halogenation/thienylation route1Issued as NRCC Publ. No. 40854.1
journal
April 1998
Impact of doping and silicon substrate resistivity on the blistering of atomic-layer-deposited aluminium oxide
journal
August 2020
Vapor-phase grafting of a model aminosilane compound to Al2O3, ZnO, and TiO2 surfaces prepared by atomic layer deposition
journal
October 2021
Effect of surface roughness and chemical composition on the wetting properties of silicon-based substrates
journal
January 2013
Spin cast self-assembled monolayer field effect transistors
journal
March 2012
Area-Selective Deposition: Fundamentals, Applications, and Future Outlook
journal
May 2020
Area-Selective Atomic Layer Deposition on Chemically Similar Materials: Achieving Selectivity on Oxide/Oxide Patterns
journal
January 2021
Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H 2 O as a Reactant
journal
June 2021
Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride
journal
July 2021
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
journal
November 2018
Mechanochemical-Cascaded C–N Cross-Coupling and Halogenation Using N -Bromo- and N -Chlorosuccinimide as Bifunctional Reagents
journal
August 2021
Bromine as a Preferred Etchant for Si Surfaces in the Supersaturation Regime: Insights from Calculations of Atomic Scale Reaction Pathways
journal
July 2016
Atomic Layer Deposition of Al2 O3 Using Aluminum Triisopropoxide (ATIP): A Combined Experimental and Theoretical Study
journal
December 2018
Substrate-Dependent Study of Chain Orientation and Order in Alkylphosphonic Acid Self-Assembled Monolayers for ALD Blocking
journal
October 2020
Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si–N Bonds
journal
October 2020
Selective Gas-Phase Functionalization of SiO2 and SiNx Surfaces with Hydrocarbons
journal
March 2021
Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition
journal
September 2021
Vapor-Phase Carbenylation of Hard and Soft Material Interfaces
journal
October 2016
Detecting and Removing Defects in Organosilane Self-Assembled Monolayers
journal
February 2020
Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide
journal
June 2021
Dense Organosilane Monolayer Resist That Directs Highly Selective Atomic Layer Deposition
journal
January 2020
Dopamine-Mediated Polymer Coating Facilitates Area-Selective Atomic Layer Deposition
journal
September 2021
Area-Selective Atomic Layer Deposition Patterned by Electrohydrodynamic Jet Printing for Additive Manufacturing of Functional Materials and Devices
journal
November 2020
Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition
journal
July 2015
Area-Selective Atomic Layer Deposition: Conformal Coating, Subnanometer Thickness Control, and Smart Positioning
journal
September 2015
Area-Selective Atomic Layer Deposition of SiO 2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
journal
September 2017
Atomic Layer Deposition: An Overview
journal
January 2010
Formation and Structure of Self-Assembled Monolayers
journal
January 1996
Attenuation of photoelectrons in monolayers of n-alkanethiols adsorbed on copper, silver, and gold
journal
September 1991
Chlorination−Methylation of the Hydrogen-Terminated Silicon(111) Surface Can Induce a Stacking Fault in the Presence of Etch Pits
journal
March 2006
Heck Coupling of Olefins to Mixed Methyl/Thienyl Monolayers on Si(111) Surfaces
journal
June 2013
Infrared and X-ray Photoelectron Spectroscopic Studies of the Reactions of Hydrogen-Terminated Crystalline Si(111) and Si(100) Surfaces with Br 2 , I 2 , and Ferrocenium in Alcohol Solvents
journal
March 2002
Controlled Grafting of Well-Defined Polymers on Hydrogen-Terminated Silicon Substrates by Surface-Initiated Atom Transfer Radical Polymerization
journal
August 2003
ALD Resist Formed by Vapor-Deposited Self-Assembled Monolayers
journal
January 2007
Angle-Resolved XPS Analysis and Characterization of Monolayer and Multilayer Silane Films for DNA Coupling to Silica
journal
March 2013
Solution Synthesis of Ultrastable Luminescent Siloxane-Coated Silicon Nanoparticles
journal
July 2004
N-Bromosuccinimide-based bromination and subsequent functionalization of hydrogen-terminated silicon quantum dots
journal
January 2014
Direct etching at the nanoscale through nanoparticle-directed capillary condensation
journal
January 2020
Solution reduction synthesis of surface stabilized silicon nanoparticles
journal
July 2002
Carboxyl functionalization of ultrasmall luminescent silicon nanoparticles through thermal hydrosilylation
journal
January 2006
Angle-resolved X-ray photoelectron spectroscopy of the surface of imidazolium ionic liquids
journal
January 2008
Reactivity of selectively terminated single crystal silicon surfaces
journal
January 2010
Benzylic Brominations with N-Bromosuccinimide in (Trifluoromethyl)benzene
journal
April 2009
Si–N linkage in ultrabright, ultrasmall Si nanoparticles
journal
June 2001
Atomic layer deposition of Al2O3 on H-passivated Si. I. Initial surface reaction pathways with H/Si(100)-2×1
journal
May 2003
Water reaction with chlorine-terminated silicon (111) and (100) surfaces
journal
October 2005
Mediation of chain reactions by propagating radicals during halogenation of H-masked Si(100): Implications for atomic-scale lithography and processing
journal
April 2009
Removal of native silicon oxide with low-energy argon ions
journal
October 1991
Cl2 plasma etching of Si(100): Nature of the chlorinated surface layer studied by angle-resolved x-ray photoelectron spectroscopy
journal
May 1997
Erratum: “Fully ALD-grown TiN/Hf0.5Zr0.5O2/TiN stacks: Ferroelectric and structural properties” [Appl. Phys. Lett. 109 , 192903 (2016)]
journal
December 2016
Perspective: New process technologies required for future devices and scaling
journal
May 2018
The tris(trimethylsilyl)silyl group in organic, coordination and organometallic chemistry
journal
November 2004
Investigation of thin oxide layer removal from Si substrates using an SiO2 atomic layer etching approach: the importance of the reactivity of the substrate
journal
June 2017
The stability of Cl-, Br-, and I-passivated Si(100)-(2 × 1) in ambient environments for atomically-precise pattern preservation
journal
August 2021
Chlorine insertion and manipulation on the Si(100)- 2 × 1 -Cl surface in the regime of local supersaturation
journal
June 2020
Atomic processes during Cl supersaturation etching of Si ( 100 ) − ( 2 × 1 )
journal
March 2009
Adsorbate-mediated step transformations and terrace rearrangement of Si ( 100 ) − ( 2 × 1 )
journal
November 2009
Chlorination of hydrogen-terminated silicon (111) surfaces
Rivillon, Sandrine; Chabal, Yves J.; Webb, Lauren J.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 23, Issue 4
https://doi.org/10.1116/1.1861941
journal
July 2005
Thin-film electronics by atomic layer deposition
journal
December 2011
Selectivity of metal oxide atomic layer deposition on hydrogen terminated and oxidized Si(001)-(2×1) surface
Longo, Roberto C.; McDonnell, Stephen; Dick, D.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 32, Issue 3
https://doi.org/10.1116/1.4864619
journal
May 2014
Enhanced atomic layer etching of native aluminum oxide for ultraviolet optical applications
Hennessy, John; Moore, Christopher S.; Balasubramanian, Kunjithapatham
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 35, Issue 4
https://doi.org/10.1116/1.4986945
journal
July 2017
Insight into the removal and reapplication of small inhibitor molecules during area-selective atomic layer deposition of SiO2
journal
January 2021
Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors
journal
January 2021
Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design
journal
May 2021
Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
Knehr, Emanuel; Ziegler, Mario; Linzen, Sven
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 39, Issue 5
https://doi.org/10.1116/6.0001126
journal
July 2021
Selective dry etching of UV-nanoimprinted resin passivation masks for area selective atomic layer deposition of aluminum oxide
Miyajima, Chiaki; Ito, Shunya; Nakagawa, Masaru
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 39, Issue 5
https://doi.org/10.1116/6.0001250
journal
September 2021
Chemical Modification of the Photoluminescence Quenching of Porous Silicon
journal
September 1993
(Invited) Current and Future Applications of ALD in Micro-Electronics
journal
October 2011
Increased selectivity in area-selective ALD by combining nucleation enhancement and SAM-based inhibition
journal
January 2021
Methods for Brominations at Benzylic Positions
journal
January 2019
Inherently Area-Selective Atomic Layer Deposition of Manganese Oxide through Electronegativity-Induced Adsorption
journal
May 2021
Optimization of Photogenerated Charge Carrier Lifetimes in ALD Grown TiO2 for Photonic Applications
journal
August 2020
Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination.
journal
November 2007
Efficient α-Halogenation of Carbonyl Compounds by N-Bromosuccinimide and N-Chlorosuccinimde
journal
April 2003