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Title: Nucleation and Growth of GaAs on a Carbon Release Layer by Halide Vapor Phase Epitaxy

Journal Article · · ACS Omega

We couple halide vapor phase epitaxy (HVPE) growth of III–V materials with liftoff from an ultrathin carbon release layer to address two significant cost components in III–V device - epitaxial growth and substrate reusability. We investigate nucleation and growth of GaAs layers by HVPE on a thin amorphous carbon layer that can be mechanically exfoliated, leaving the substrate available for reuse. We study nucleation as a function of carbon layer thickness and growth rate and find islandlike nucleation. We then study various GaAs growth conditions, including V/III ratio, growth temperature, and growth rate in an effort to minimize film roughness. High growth rates and thicker films lead to drastically smoother surfaces with reduced threading dislocation density. Finally, we grow an initial photovoltaic device on a carbon release layer that has an efficiency of 7.2%. The findings of this work show that HVPE growth is compatible with a carbon release layer and presents a path toward lowering the cost of photovoltaics with high throughput growth and substrate reuse.

Research Organization:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Organization:
USDOE Office of Energy Efficiency and Renewable Energy (EERE), Renewable Power Office. Solar Energy Technologies Office; USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
35365; AC36-08GO28308
OSTI ID:
2208860
Alternate ID(s):
OSTI ID: 2222413; OSTI ID: 2222655
Report Number(s):
NREL/JA-5K00-84015
Journal Information:
ACS Omega, Journal Name: ACS Omega Vol. 8 Journal Issue: 47; ISSN 2470-1343
Publisher:
American Chemical SocietyCopyright Statement
Country of Publication:
United States
Language:
English

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